US Patent 7727912 Method of light enhanced atomic layer deposition
Patent 7727912 was granted and assigned to Tokyo Electron on June, 2010 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
March 20, 2006
Date of Patent
June 1, 2010
Patent Application Number
11378270
Patent Inventor Names
Tadahiro Ishizaka
0
Frank M. Cerio, Jr.
0
Jacques Faguet
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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