Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 1, 2010
Patent Application Number
11594625
Date Filed
November 8, 2006
Patent Primary Examiner
Patent abstract
A system and method for inspecting a specimen, such as a semiconductor wafer, including illuminating at least a portion of the specimen using an excimer source using at least one relatively intense wavelength from the source, detecting radiation received from the illuminated portion of the specimen, analyzing the detected radiation for potential defects present in the specimen portion.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
