Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hun Rock Jung0
Hee Sung Kim0
Date of Patent
June 8, 2010
Patent Application Number
11399875
Date Filed
April 7, 2006
Patent Primary Examiner
Patent abstract
An apparatus for providing a photoresist material onto a substrate includes a lid housing at least one nozzle. A solvent supplying port inputs the solvent into the apparatus. A first solvent trap is provided below the nozzle and coupled to the solvent supplying port to hold a given amount of the solvent being input from the solvent supplying port. The first solvent trap is configured to prevent photoresist residues on the nozzle from being converted to powders. A second solvent trap is provided below the first solvent trap to receive the solvent from the first solvent trap. A solvent path is provided between the solvent trap and the solvent container to guide the solvent from the first solvent trap to the second solvent trap.
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