US Patent 7737036 Integrated circuit fabrication process with minimal post-laser annealing dopant deactivation

Patent 7737036 was granted and assigned to Applied Materials on June, 2010 by the United States Patent and Trademark Office.

Is a

Current Assignee

Patent Jurisdiction

Patent Number

Date of Patent

June 15, 2010

Patent Application Number

11836267

Date Filed

August 9, 2007

Patent Primary Examiner

Patent abstract

Post-laser annealing dopant deactivation is minimized by performing certain low temperature process steps prior to laser annealing.

No Timeline data yet.

Title

Author

Link

Type

Date

No Further Resources data yet.

Find more entities like US Patent 7737036 Integrated circuit fabrication process with minimal post-laser annealing dopant deactivation

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.