Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 15, 2010
Patent Application Number
11134625
Date Filed
May 23, 2005
Patent Citations Received
Patent Primary Examiner
Patent abstract
A method, computer program product, and apparatus configured to improve attribute uniformity of a substrate is disclosed. In an embodiment, the method involves calculating corrective data based on measured values of an attribute of a substrate processed by a lithographic exposure apparatus, the corrective data configured to at least partially correct non-uniformity of the values of the substrate attribute by controlling the temperature generated by a zone of a thermal plate used to heat or cool the substrate, and making the corrective data available to the thermal plate.
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