US Patent 7738078 Optimized mirror design for optical direct write
Patent 7738078 was granted and assigned to LSI Corporation on June, 2010 by the United States Patent and Trademark Office.
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The present invention provides an optimized direct write lithography system using optical mirrors. That is, a maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array is used as a substitute for the traditional chrome on glass masks. In order to avoid constraining the system to forming edges of patterns aligned with the array of mirrors, gray-scale techniques are used for subpixel feature placement. The direct-writing of a pattern portion may rely on a single mirror mode or a combination of modes.
US Patent 07738078 Optimized mirror design for optical direct write US Patent 7738078 Optimized mirror design for optical direct write
US Patent 07738078 Optimized mirror design for optical direct write
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