US Patent 7738276 Semiconductor device and method for manufacturing
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Patent abstract
A first region having a first pattern which includes a first minimum dimension, a second region having a second pattern which includes a second minimum dimension larger the first minimum dimension, the second region being arranged adjacent to the first region, wherein a boundary between the first region and the second region is sectioned by a width which is twice of more of a minimum dimension which exists in an adjacent region.
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Patent Inventor Names
Kosuke Yanagidaira0
Takuya Futatsuyama0
Toshiya Kotani0
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US Patent 07738276 Semiconductor device and method for manufacturing US Patent 7738276 Semiconductor device and method for manufacturing
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Patent Number
07738276
Patent Number
7738276
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Official Website
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US Patent 07738276 Semiconductor device and method for manufacturing
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Patent jurisdiction
Patent number
07738276
Date of patent
June 15, 2010
Patent application number
12169270
Date Filed
July 8, 2008
Patent primary examiner
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