Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Rong-Zhi Chen0
Jui-Tung Chang0
Jye-Long Lee0
Pa-Tsui Sze0
In-Ting Hong0
Date of Patent
July 13, 2010
0Patent Application Number
118927550
Date Filed
August 27, 2007
0Patent Primary Examiner
Patent abstract
A method for manufacturing a sputtering target includes the steps of: providing a highly pure matrix material containing a magnetic metal, and a highly pure precious metal ingot material; cleaning the surfaces of the matrix material and the precious metal ingot; vacuum melting the matrix material and the precious metal ingot to obtain a molten alloy; pouring the molten alloy in a mold having a cooling system while maintaining a surface of the molten alloy at a molten state by arc heating until the pouring is finished, thereby forming the molten alloy into a cast blank; hot working the cast blank; and annealing the cast blank after the hot working.
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