US Patent 7754667 Low-irritation compositions and methods of making the same

Provided are compositions comprising low molecular weight polymeric materials and surfactants having reduced irritation associated therewith, methods of reducing the irritation associated with a personal care composition comprising an anionic and/or amphoteric surfactant, the methods comprising combining a low molecular weight polymeric material capable of binding a surfactant thereto with an anionic surfactant to produce a reduced irritation personal care composition, and methods of using such compositions to cleanse the hair or skin with reduced irritation.