US Patent 7759874 Apparatus for effecting plasma chemical vapor deposition (PCVD)

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Patent

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Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7759874

Patent Inventor Names

Rob Hubertus Matheus Deckers0

Johannes Antoon Hartsuiker0

Marco Korsten0

Mattheus Jacobus Nicolaas Van Stralen0

Date of Patent

July 20, 2010

Patent Application Number

11762959

Date Filed

June 14, 2007

Patent Primary Examiner

Douglas W Owens

Patent abstract

The present invention relates to an apparatus for carrying out a plasma chemical vapor deposition process by which one or more layers of doped or undoped silica can be deposited on the interior of an elongated glass substrate tube. The present invention further relates to a method for manufacturing an optical fiber using such an apparatus.

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