US Patent 7760349 Mask-defect inspecting apparatus with movable focusing lens
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Patent abstract
A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (18a, 20a) for adjusting an angle of an aperture.
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US Patent 07760349 Mask-defect inspecting apparatus with movable focusing lens US Patent 7760349 Mask-defect inspecting apparatus with movable focusing lens
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Patent Number
0776034900
Patent Number
776034900
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Patent Jurisdiction
Patent Number
077603490
Date of Patent
July 20, 2010
0Patent Application Number
110833230
Date Filed
March 18, 2005
0Official Website
Patent Primary Examiner
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Infobox
Is a
Patent Jurisdiction
Patent Number
077603490
Date of Patent
July 20, 2010
0Patent Application Number
110833230
Date Filed
March 18, 2005
0Official Website
Patent Primary Examiner
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US Patent 07760349 Mask-defect inspecting apparatus with movable focusing lens
Infobox
Is a
Patent jurisdiction
Patent number
07760349
Date of patent
July 20, 2010
Patent application number
11083323
Date Filed
March 18, 2005
Patent primary examiner
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