US Patent 7761819 System and method of modification of integrated circuit mask layout

Integrated circuit mask layouts are modified for the purpose of migration to abide a new set of design rules, or for the purpose of optimization for timing, power, signal integrity and manufacturability, among other purposes. The modified layout is required to satisfy a set of constraints generated from design rules, electrical specifications, user specifications among other requirements. The present invention provides a system and a method of representing constraint sets, each of which consists of two or more sets of constraints that are mutually exclusive to each other. In the preferred embodiment, one method of formulation is presented, and a method of solving the layout modification problem under the constraint sets is presented.