Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jeong-Min Park0
Hi-Kuk Lee0
Jang-Soo Kim0
Date of Patent
July 27, 2010
0Patent Application Number
114304140
Date Filed
May 9, 2006
0Patent Primary Examiner
Patent abstract
A method of fabricating a semiconductor device is provided. The method includes forming at least one etch target film on a substrate, forming a first reflowable etch mask on the at least one etch target film, patterning the etch target film using the first reflowable etch mask. The method further includes reflowing the first reflowable etch mask to form a second etch mask and patterning the etch target film using the second etch mask.
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