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US Patent 7765077 Method and apparatus for creating a Spacer-Optimization (S-O) library

Patent 7765077 was granted and assigned to Tokyo Electron on July, 2010 by the United States Patent and Trademark Office.

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Patent abstract

The invention can provide a method of processing a substrate using Spacer-Optimization (S-O) processing sequences and evaluation libraries that can include one or more optimized spacer creation and evaluation procedures. In addition, the S-O processing sequences can include one or more deposition procedures, one or more partial-etch procedures, one or more chemical oxide removal (COR)-etch procedures, one or more optimization procedures, one or more evaluation procedures, and/or one or more verification procedures.

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