Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Wei Wu0
Duncan R. Stewart0
Date of Patent
August 3, 2010
0Patent Application Number
112035510
Date Filed
August 12, 2005
0Patent Primary Examiner
Patent abstract
A contact lithography apparatus, system and method use a deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart parallel and proximal orientation of lithographic elements, such as a mask and a substrate, when in mutual contact with the spacer. One or more of the mask, the substrate and the spacer is deformable, such that deformation thereof facilitates the pattern transfer.
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