Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 3, 2010
Patent Application Number
10575916
Date Filed
September 28, 2004
Patent Primary Examiner
Patent abstract
A patterning method with a filling material with a T-shaped cross section is used as a mask during patterning to produce structures having sublithographic dimensions, such as a double-fin field effect transistor.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
