Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 3, 2010
Patent Application Number
11525179
Date Filed
September 22, 2006
Patent Primary Examiner
Patent abstract
A method of manufacturing a semiconductor device, includes forming a sacrifice film on an etching target film, forming an etching mask on the sacrifice film, etching the etching target film using the etching mask as a mask, removing the sacrifice film to allow the etching mask to adhere to the etching target film, and removing the etching mask.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
