Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 10, 2010
Patent Application Number
12402095
Date Filed
March 11, 2009
Patent Citations Received
Patent Primary Examiner
Patent abstract
An exposure method for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes the steps of obtaining a relationship between an exposure parameter that determines a mode to expose a plate, and an electrical characteristic of a device derived from the device, determining whether the device obtained from the set exposure parameter has a predetermined electrical characteristic, and adjusting the set exposure parameter based on the relationship between the exposure parameter and the electrical characteristic, if the determining step determines that the device does not have the predetermined electrical characteristic.
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