Patent attributes
A method for making a carbon nanotube-based device is provided. A substrate having a shadow mask layer to define an unmasked surface area thereon is provided. A sputter source is disposed on the shadow mask layer. The sputter source is configured for supplying a catalyst material and depositing the catalyst material onto the substrate. A catalyst layer including at least one catalyst block is formed on the substrate. A thickness of the at least one catalyst block is gradually decreased from one end to another opposite end thereof. The at least one catalyst block has a region with a thickness proximal or equal to an optimum thickness. A carbon source gas is introduced. At least one carbon nanotube array extending from the catalyst layer using a chemical vapor deposition process is formed. The at least one carbon nanotube array is arc-shaped, and bend in a direction of deviating from the region.
