Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Waki Ohkubo0
Shinichi Hidesaka0
Yusuke Nakagawa0
Yohei Kinoshita0
Makiko Irie0
Date of Patent
August 24, 2010
0Patent Application Number
119145090
Date Filed
April 18, 2006
0Patent Primary Examiner
Patent abstract
The present invention is a positive resist composition and a resist pattern forming method including a resin component (A) which has a polymer compound (A1) having a structural units (a1) including an acetal type acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an acrylate ester having a lactone-containing polycyclic group, and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group, and an acid generator component (B) having an onium salt-based acid generator (B1) having a cation portion represented by a general formula (b-1) shown below
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