Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yukiharu Takeuchi0
Hideaki Sakaguchi0
Date of Patent
August 31, 2010
0Patent Application Number
121787670
Date Filed
July 24, 2008
0Patent Primary Examiner
Patent abstract
A substrate and mask aligning apparatus includes a controlling portion 70 for calculating moving data that are applied to eliminate a difference between a present superposed state of the through holes 52 of the mask 50, which comes into contact with the substrate 20 that is loaded on the stage 30, on the pads 22 of the substrate 20 and a scheduled superposed state on the basis of image data from the shooting section 40, 42 and then executing repeatedly an operation to move the stage 30 on the basis of the calculated moving data of the stage.
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