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US Patent 7791732 Method and apparatus for angular-resolved spectroscopic lithography characterization

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Paul Frank Luehrmann0

Youri Johannes Laurentius Maria Van Dommelen0

Antoine Gaston Marie Kiers0

Arie Jeffrey Maria Den Boef0

Arno Jan Bleeker0

Cedric Desire Grouwstra0

Henricus Petrus Maria Pellemans0

Markus Gerardus Martinus Van Kraaij0

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Date of Patent

September 7, 2010

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Patent Application Number

112034180

Date Filed

August 15, 2005

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Patent Citations Received

US Patent 11784098 Method and apparatus to determine a patterning process parameter

US Patent 11710668 Method and apparatus to determine a patterning process parameter

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Patent Primary Examiner

Gregory J. Toatley, Jr

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Patent abstract

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

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