Patent attributes
Method for supplying a high purity gas product comprising providing a first gas stream including a major component and at least one impurity component, determining the concentration of the at least one impurity component, and comparing the concentration so determined with a reference concentration for that component. When the value of the concentration so determined is less than or equal to the reference concentration, the first gas stream is utilized to provide the high purity gas product. When the value of the concentration so determined is greater than the reference concentration, a second gas stream comprising the major component is provided and the first and second gas streams are mixed to yield a mixed gas stream having a concentration of the at least one impurity component that is less than the reference concentration. The second gas stream is provided by dividing the first gas stream into a first substream and a second substream, removing at least a portion of the at least one impurity component in the first substream to provide a purified substream, and mixing the purified substream with the second substream to provide the high purity gas product. The mixed gas stream is utilized to provide the high purity gas product.
