Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Katsuhito Nishikawa0
Aaron David Ingles0
Gary M. Moore0
Date of Patent
September 14, 2010
0Patent Application Number
112542940
Date Filed
October 19, 2005
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A process gas to a reactor volume of a semiconductor processing reactor is provided through gas injector ports of a gas ring. The process gas flows horizontally from the gas injector ports across a principal surface of a rotating susceptor to exhaust ports of the gas ring. The spent process gas is removed from the reactor volume through the exhaust ports.
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