Patent 7795109 was granted and assigned to Qimonda on September, 2010 by the United States Patent and Trademark Office.
Methods of forming isolation trenches, semiconductor devices, structures thereof, and methods of operating memory arrays are disclosed. In one embodiment, an isolation trench includes a recess disposed in a workpiece. A conductive material is disposed in a lower portion of the channel. An insulating material is disposed in an upper portion of the recess over the conductive material.