Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 14, 2010
Patent Application Number
11664989
Date Filed
September 27, 2005
Patent Primary Examiner
Patent abstract
There is provided an anti-reflective coating forming composition for lithography comprising a reaction product obtained by reacting a sulfur-containing compound having thiourea structure with a nitrogen-containing compound having two or more nitrogen atoms substituted with a hydroxymethyl group or an alkoxymethyl group in the presence of an acid catalyst and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists and can use in lithography process for manufacturing semiconductor device.
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