Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 28, 2010
Patent Application Number
12420692
Date Filed
April 8, 2009
Patent Primary Examiner
Patent abstract
A method for manufacturing a semiconductor device using a photoresist polymer comprising a fluorine component, a photoresist composition containing the photoresist polymer and an organic solvent to reduce surface tension, by forming a photoresist film uniformly on the whole surface of an underlying layer pattern to allow a subsequent ion-implanting process to be stably performed.
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