US Patent 7819985 Method and apparatus for wafer cleaning
Patent 7819985 was granted and assigned to Applied Materials on October, 2010 by the United States Patent and Trademark Office.
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Patent abstract
An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.
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Patent Inventor Names
Alexander Ko0
J. Kelly Truman0
Rick R. Endo0
Steven Verhaverbeke0
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US Patent 07819985 Method and apparatus for wafer cleaning US Patent 7819985 Method and apparatus for wafer cleaning
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Patent Number
078199850
Patent Number
78199850
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
078199850
Date of Patent
October 26, 2010
0Patent Application Number
114971930
Date Filed
July 31, 2006
0Official Website
Patent Primary Examiner
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US Patent 07819985 Method and apparatus for wafer cleaning
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07819985
Date of patent
October 26, 2010
Patent application number
11497193
Date Filed
July 31, 2006
Patent primary examiner
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