Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 2, 2010
Patent Application Number
11549732
Date Filed
October 16, 2006
Patent Citations Received
Patent Primary Examiner
Patent abstract
In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.
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