Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Seiji Inaoka0
Date of Patent
November 2, 2010
0Patent Application Number
116306020
Date Filed
February 1, 2005
0Patent Primary Examiner
Patent abstract
Back end photoresist strippers and residue compositions are provided by non-aqueous compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise a polar organic solvent, a hydroxylated amine, and as a corrosion inhibitor fructose.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
