Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Wei Wu0
Carl Picciotto0
Jun Gao0
Date of Patent
November 9, 2010
0Patent Application Number
115482160
Date Filed
October 10, 2006
0Patent Primary Examiner
Patent abstract
A contact lithography apparatus, system and method use a hydraulic deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart proximal orientation of lithographic elements, and a hydraulic force member that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.
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