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Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 16, 2010
Patent Application Number
11544463
Date Filed
October 6, 2006
Patent Primary Examiner
Patent abstract
The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications. In one embodiment, the present invention provides a photoacid generator of Formula (I):
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