Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Stanislav Smirnov0
Mark Oskotsky0
Date of Patent
November 16, 2010
Patent Application Number
12389593
Date Filed
February 20, 2009
Patent Primary Examiner
Patent abstract
An off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate is provided. The optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. The projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. Alternatively, the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group.
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