Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 23, 2010
Patent Application Number
12072790
Date Filed
February 28, 2008
Patent Citations Received
Patent Primary Examiner
Patent abstract
The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193 nm.
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