Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Vincent Chang0
George Liu0
Kuei Shun Chen0
Norman Chen0
Date of Patent
November 23, 2010
Patent Application Number
11456152
Date Filed
July 7, 2006
Patent Primary Examiner
Patent abstract
Photolithography processing methods by which a photoresist layer is deposited, a portion of the photoresist layer is exposed to electromagnetic radiation to transfer a reticle pattern thereto, and the exposed portion of the photoresist layer is treated with thermal energy while being subjected to an electric field, wherein the electric field is configured to substantially limit diffusion of the exposed photoresist layer portion to anisotropic diffusion.
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