Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ka-Hing Fung0
Date of Patent
November 30, 2010
0Patent Application Number
121276460
Date Filed
May 27, 2008
0Patent Primary Examiner
Patent abstract
A method of forming an integrated circuit structure includes providing a semiconductor substrate; forming a first isolation region in the semiconductor substrate; after the step of forming the first isolation region, forming a metal-oxide-semiconductor (MOS) device at a surface of the semiconductor substrate, wherein the step of forming the MOS device comprises forming a source/drain region; and after the step of forming the MOS device, forming a second isolation region in the semiconductor substrate.
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