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US Patent 7846793 Plasma surface treatment for SI and metal nanocrystal nucleation

Patent 7846793 was granted and assigned to Applied Materials on December, 2010 by the United States Patent and Trademark Office.

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Patent abstract

A device, such as a nonvolatile memory device, and methods for forming the device in an integrated process tool are provided. The method includes depositing a tunnel oxide layer on a substrate, exposing the tunnel oxide layer to a plasma so that the plasma alters a morphology of a surface and near surface of the tunnel oxide to form a plasma altered near surface. Nanocrystals are then deposited on the altered surface of the tunnel oxide.

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