Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Nigel Peter Smith0
Yi-Sha Ku0
Hsiu Lan Pang0
Date of Patent
December 7, 2010
0Patent Application Number
121258160
Date Filed
May 22, 2008
0Patent Primary Examiner
Patent abstract
In an overlay metrology method used during semiconductor device fabrication, an overlay alignment mark facilitates alignment and/or measurement of alignment error of two layers on a semiconductor wafer structure, or different exposures on the same layer. A target is small enough to be positioned within the active area of a semiconductor device combined with appropriate measurement methods, which result in improved measurement accuracy.
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