Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 14, 2010
Patent Application Number
11681325
Date Filed
March 2, 2007
Patent Primary Examiner
Patent abstract
A method includes exposing a photo-resist layer using a first exposure machine that has a first resolution to cause the photo-resist layer to have an exposed portion and an un-exposed portion. The photo-resist layer is exposed using a second exposure machine that has a second resolution to further expose the un-exposed portion of the photo-resist layer, the first resolution being different from the second resolution.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
