Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chen-Hua Yu0
Liang-Gi Yao0
Date of Patent
December 14, 2010
Patent Application Number
11652209
Date Filed
January 11, 2007
Patent Primary Examiner
Patent abstract
A chemical vapor deposition (CVD) method includes placing a semiconductor wafer into a reaction chamber; introducing a precursor into the reaction chamber; activating the precursor to a high-energy state using a non-direct plasma energy source; and reacting the precursor to form a film on the semiconductor wafer.
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