US Patent 7852704 Semiconductor storage device

A semiconductor storage device according to one aspect of the present invention includes a DRAM cell including one transistor and one capacitor, in which one of a first voltage and a second voltage is applied to a gate of the transistor, the first voltage being a selected voltage, and the second voltage being a non-selected voltage, a voltage difference between the first voltage and the second voltage is larger than a voltage difference between a power supply voltage and a ground voltage, and one of the ground voltage and the power supply voltage which is closer to the non-selected voltage is applied to a back gate of the transistor irrespective of selection or non-selection.