Patent attributes
An apparatus and method for exposing an edge of a substrate are disclosed, in which an exposure time period for exposing the edge of the substrate is reduced. The apparatus for exposing an edge of a substrate includes a loading unit loading the substrate, and an edge exposure unit exposing the edge of the substrate loaded by the loading unit using each of a long side exposure unit and a short side exposure unit. Therefore, since the edge of the substrate is exposed using each of the long side exposure unit and the short side exposure unit, it is possible to reduce the edge exposure time period, thereby improving productivity. In addition, since no rotation of the substrate is required, it is possible to reduce the size of the apparatus. Moreover, since the apparatus is provided in an in-line type, it is possible to easily draw the substrate using a conveyer.
