Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yool Kang0
Ji-Young Lee0
Sang-Gyun Woo0
Seok-Hwan Oh0
Cha-Won Koh0
Gi-Sung Yeo0
Date of Patent
January 4, 2011
0Patent Application Number
115293100
Date Filed
September 29, 2006
0Patent Primary Examiner
Patent abstract
Provided is a method for forming patterns of a semiconductor device. According to the method, first mask patterns may be formed on a substrate, and second mask patterns may be formed on sidewalls of each first mask pattern. Third mask patterns may fill spaces formed between adjacent second mask patterns, and the second mask patterns may be removed. A portion of the substrate may then be removed using the first and third mask patterns as etch masks.
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