Patent attributes
A capacitor structure includes an insulating layer, first conductive patterns, second conductive patterns, an insulating interlayer, third conductive patterns, and fourth conductive patterns. The first and second conductive patterns are alternately arranged on the insulating layer to be spaced apart from one another. The first and second conductive patterns have side faces where concave portions and convex portions are formed. The insulating interlayer is formed on the insulating layer to cover the first and second conductive patterns. The third and fourth conductive patterns are alternately arranged on the insulating interlayer to be spaced apart from one another. The third and fourth conductive patterns have side faces where concave portions and convex portions are formed.