Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Dai Oguro0
Masatoshi Echigo0
Date of Patent
January 18, 2011
0Patent Application Number
115785870
Date Filed
April 14, 2005
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A radiation-sensitive composition containing a resist compound A, an acid generator B, and an acid crosslinking agent C. The resist compound A is (a) a polyphenol compound which is produced by the condensation of a C5-45 aromatic ketone or aromatic aldehyde with a C6-15 compound having from 1 to 3 phenolic hydroxyl groups, and, (b) its molecular weight is form 300 to 5000. The radiation-sensitive composition is solvent-soluble and exhibits a high sensitivity, high resolution, and high heat resistance.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
