Patent 7882612 was granted and assigned to Infineon Technologies on February, 2011 by the United States Patent and Trademark Office.
A method for producing a membrane for a device, e.g. a microphone, includes providing a substrate is provided on which a counter electrode is disposed. A sacrificial layer is provided on a surface of the counter electrode facing away from the substrate. The surface of the sacrificial layer facing away from the counter electrode is structured to form a plurality of recesses in the surface to define one or several antistick elements and one or several corrugation grooves at the same time. Subsequently, a membrane material is deposited on the structured surface of the sacrificial layer. Then, the sacrificial layer is removed to form the membrane, which has one or several corrugation grooves and one or several antistick elements.