Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Te-Shao Hsu0
Date of Patent
February 22, 2011
Patent Application Number
11939741
Date Filed
November 14, 2007
Patent Primary Examiner
Patent abstract
A method for forming a patterned photoresist is provided, which is applicable to a substrate. The method includes: performing an implantation process over the substrate; next, performing a surface treatment process; then, forming a photoresist layer over the substrate; and thereafter, patterning the photoresist layer.
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