Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Sheng-Chen Chung0
Shun-Jang Liao0
Chung Long Cheng0
Harry Chuang0
Jung-Hui Kao0
Kong-Beng Thei0
Mong Song Liang0
Date of Patent
March 1, 2011
0Patent Application Number
118331280
Date Filed
August 2, 2007
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A semiconductor structure and methods of forming the same are provided. The semiconductor structure includes a semiconductor substrate; a first inter-layer dielectric (ILD) over the semiconductor substrate; a contact extending from a top surface of the first ILD into the first ILD; a second ILD over the first ILD; a bottom inter-metal dielectric (IMD) over the second ILD; and a dual damascene structure comprising a metal line in the IMD and a via in the second ILD, wherein the via is connected to the contact.
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