US Patent 7899095 Laser lithography system with improved bandwidth control
Patent 7899095 was granted and assigned to Cymer on March, 2011 by the United States Patent and Trademark Office.
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A method and apparatus may comprise a seed laser, along with an amplifier laser amplifying the output of the seed laser. A bandwidth metrology module may provide a bandwidth measurement and a bandwidth error signal may be provided using a bandwidth set point. A differential timing system responsive to the error signal can selectively adjust a differential firing time between the seed laser and amplifier laser. A beam dimension and center wavelength control system may adjust a beam dimension, within the cavity of the seed laser, to select bandwidth, and may adjust center wavelength at the same time, using a plurality of beam expansion prisms and at least one other prism or other optical element in the cavity to select center wavelength.
US Patent 07899095 Laser lithography system with improved bandwidth control US Patent 7899095 Laser lithography system with improved bandwidth control
US Patent 07899095 Laser lithography system with improved bandwidth control
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