Patent attributes
Disclosed herein is a composition comprising a structure (M1)a(ME)b(D1)c(D2)d(T)e(Q)f, wherein M1=R1R2R3SiO1/2; ME=R4R5RESiO1/2; D1=R6R7SiO2/2; D2=R8R9SiO2/2; T=R10SiO3/2; and Q=SiO4/2; wherein each RE is independently a monovalent hydrocarbon radical containing an epoxy group; R9 comprises a structure -L1-Si(R11)g(OR12)3-g or L2(D3)h(M2)i-L3-Si(R13)g′(OR14)3-g′, wherein L1, L2, and L3 are independently divalent linking groups; g and g′ independently have a value from 0 to 2; M2=R15R16R17SiO1/2; D3=R18R19SiO2/2; wherein R1, R2, R3, R4, R5, R6, R7, R8, R10, R11, R12, R13, R14, R15, R16, R17, R18, and R19 are independently monovalent hydrocarbon radicals; wherein a, b, c, d, e, f, h, and i are stoichiometric subscripts that are zero or positive subject to the following limitations: b has a value of 2; d is greater than or equal to 1; when (a+c+e+f) is equal to zero, (b+d) is greater than or equal to 3; and when i=0, h is at least 1.
